Laser nanoFab Logo

Select your language

M4D - Two-Photon-Polymerisation

Direct laser writing by two-photon polymerization (2PP) of photoresists is an emerging technique for the fast and flexible fabrication of fully three-dimensional (3D) structures with structure sizes down to less than 100 nm. The M4D micro- and nanostructuring system enables high-speed generation of 2D and 3D micro- and nanostructures over large areas and volumes.

Applications

  • Microfludics
  • Biology
  • Medicine
  • Microoptics
  • Micromechanics
  • 3D Free-form structuring
  • 2D Surface structuring

TECHNOLOGIES

  • Polymerization of photoresists with femtosecond laser
  • Submicrometer resolution with two-photon polymerization
  • Micro- and nanostructuring

MATERIALIEN

  • Our optimized photoresists for 2PP: femtoBond®
  • Standard photoresists for lithography
  • Biodegradable and biocompatible photoresists

FAKTEN

  • Rapid Prototyping from Nanometer to Millimeter
  • Key technology for 3D nano rapid prototyping
  • For research and development

PARAMETERS

Resolution

100nm – 100µm

Positioning Speed (typical)

up to 50 mm/s

Scanning Speed (typical)

up tp 1 m/s

Polymerization Volume (typical)

10cm x 10cm x 10cm

Lasertypes

Ultrashort Lasers

System

Open Design, customer specific
modifications possible

Footprint

ca. 1 m²


Configuration example

femtosecond pump laser wavelength

1030nm

pump laser power

10W

pump laser rep. rate

1kHz to 1 MHz

pump laser pulse duration

290 fs-10 ps

second harmonic generator:

 

laser output power

>0.7 W

pulse duration

< 100 fs

wavelength

515 nm

repetition rate 

75 MHz ± 1

linear axes

air-bearing

bidirectional repeatibility

< ±0,075 µm

speed (w/o load)

(XY) 2m/s , (Z) 1m/s

objective

NA 0.5

2PP-structure height (Z) 

WOW-2PP prepared, structure height in Z only limited by the travel of the Z-axis

software

can be extended with own Visual Studio modules

 

Other configurations are available.