femtoBond - Photoresists
femtoBond® is our line of unique photoresists designed for 2D and 3D lithography techniques such as two-photon polymerization (2PP).
femtoBond® 4B
...is our proven photoresist for use with near-infrared lasers e.g. around 800 nm.
femtoBond® 4C
...is our proven photoresist for use with near-infrared lasers e.g. around 520 nm.
Vorteile
- Negative photoresist
- Highest resolution
- Easy handling
- Robust processing
- Very low shrinkage
- Biocompatible
- Transparent in polymerized state
- True 2PP resist, hardly affected by daylight
- Organic-inorganic hybrid material